Production of ultra-pure substances

for the semiconductor and fibre-optic industries.

 

Areas of technical expertise developed in the Ukraine and available for possible applications in the current activities of the NSF/SRC Engineering Research Center for Environmentally Benign Semiconductor Manufacturing.

 

 

 

Prepared by:    Prof. William Zadorsky, Ukrainian State University of Chemical Engineering, Pridneprovie Cleaner Production Center

E-mail: ecofond@ecofond.dp.ua

 

                        Stanislav Induchny, Technology Transfer Consultant

                        E-mail: Induchny@btinternet.com

 

 

This paper provides a brief guideline of new methods and techniques in the improvement of chemical processes and technological equipment in the semiconductor and fibre-optic industries that have been developed by Ukrainian specialists.

 

Table 1 below outlines major methods adopted for the optimisation of various technological stages of deep purification in the semiconductor and fibre-optic production.

 

Table columns represent methods and devices for process optimisation, and table rows represent major technological stages in deep purification of ultra-pure substances for the semiconductor and fibre-optic production.

 

The X sign means that the given method or device has been utilised in the given technological stage.

 

 

 

 

 

 

 

 

 

 

 

 

TABLE 1

 

 

 

 

 

 

TECHNOLOGICAL STAGES

IN DEEP PURIFICATION

TECHNOLOGICAL METHODS

STRUCTURAL MEANS

Multiple inversion of phases

Thermo-condensation

Thermo-decompression

Combination of chemical reaction with mass-transfer  process

Capillary effect

Application of transporting chemical reactions

Chemical re-circulation

Cyclic mode of phase introduction

Apparatus with rising direct flow of phases

Combination of bubbling and film zones in one section

Counter-flow gas-liquid apparatus

Polymer and composite materials in apparatus

Self-regulating valve contact devices

Rectification of initial chlorides on the example of germanium tetrachloride

 

 

 

 

 

 

 

X

 

X

X

X

X

Purification of raw materials, intermediary products and solvents from submicron particles.

 

 

 

X

 

 

X

 

 

 

 

X

 

 

 

X

 

X

Removal of submicron particles from gaseous raw materials and technological gases.

 

X

 

 

 

 

 

 

X

X
X

X

X

Absorptive purification of gaseous emissions.

X

 

 

 

 

 

 

 

X

X

X

X

X

Purification of semi-products from limiting admixtures of chlorine.

X

 

 

X

 

X

X

 

X

 

X

X

X

Rectification of aprotic solvents (dimethyl formamide, dimethyl acetamide, 1,4 dioxane)

 

 

 

 

 

 

 

 

 

X